Sputter targets

PVD-materials

Sputter Targets Gallery

More about Sputtering

The source of sputtering

About sputter targets

Sputter targets are the consumed material source in sputtering process, an important PVD tehcchnology. Compared with other PVD methods, sputtering process is relatively simple, with lower temperature required on the source material.

The sputter targets could be classified by materials as follows,

1. Pure element

The component of sputter target has only one element. Such as Rhenium sputter target (photo above).

2. Alloy

The target is made by alloy, usually a combination of two or multiple metal elements,e.g. Mo-La sputter target. To produce the alloys, different metals are molten together in crucibles, usually ceramic crucibles. Check this page for more about ceramic crucibles and their properties.

3.Ceramic

Including oxide, sulfide, nitride, cabide and other ceramic materials. Ceramic sputter targets are usually produced by hot pressing the powder of the raw materials. Usually Ceramic sputtering targets are produced by hot pressing technique.